LAZIN LODAS™ – AI50/100
Application：
Electronic Assembly
Semiconductor
Photomask Blanks inspection system
Main advantages
Features：
For Photomask Blanks for Semiconductor Shipment Inspection, Process Evaluation
Defect analysis by differential interference microscope
Inspection target : Photomask Substrate, Cr, Resist, MoSi
Inspection items : Particles, internal defects (Option)
Inspection sensitivity: PDM defect size 0.1 μm (AI100)